IPA vapor condensation replacement drying device
IPA vapor condensation replacement drying device suitable for the drying of ultra-thin Si device manufacturing.
We propose our IPA vapor drying device, which has been developed with a focus on preventing the occurrence of watermarks on substrate surfaces, a common issue in various semiconductor and electronic device manufacturing processes. Additionally, this device serves as a rational cleaning and drying apparatus that not only dries optical and uneven parts requiring clean drying but also performs a high-purity finishing wash using distilled IPA simultaneously. 【Features】 ■ One of the largest market shares in the world ■ Safe design ■ Watermark-free drying ■ Clean drying ■ Capable of drying a wide range of materials, etc. *For more details, please download the PDF or contact us.
- Company：ワイエイシイメカトロニクス つくば事業所 PV事業部
- Price：Other
